专利名称：Sulfonium salts and chemically amplified
positive resist compositions
发明人：Youichi Ohsawa,Satoshi Watanabe,Junji
Shimada,Katsuya Takemura,ShigehiroNagura,Toshinobu Ishihara
申请号：US08/811530申请日：19970304公开号：US05847218A公开日：19981208
摘要：The invention provides a novel sulfonium salt having a substituted orunsubstituted arylsulfonate anion. The novel sulfonium salt minimizes the influence ofdeactivation by basic compounds not only at a resist surface, but also at a resist-substrate interface, assists a resist to be configured to a definite pattern profile. Whenthe sulfonium salt has an acid labile group, it is effective for increasing the dissolutioncontrast between exposed and unexposed areas. The sulfonium salt is useful in achemically amplified positive resist composition which lends itself to fine patterning andfeatures high resolution.
申请人：SHIN-ETSU CHEMICAL CO., LTD.
代理机构：Millen, White, Zelano & Branigan, P
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