Method of manufacturing an optical device with a g

专利名称：Method of manufacturing an optical device

with a groove accurately formed

发明人：Satoru Mizuta,Hiroshi Nishimoto申请号：US08/781810申请日：19970110公开号：US05961683A公开日：19991005

摘要：A first layer (2) and a second layer (3) are formed on a substrate (1). The firstlayer is made of a resist against a groove- sculpturing etchant used in etching thesubstrate while the second layer is made of an anti- corrosive material against dryetching. The second layer is at first patterned into a patterned second layer (3a) in theform of a groove- sculpturing mask pattern (8). With the patterned second layer used asa mask, the first layer is etched and patterned into a patterned first layer (2a) in the formof the above-mentioned mask pattern. With the patterned first layer used as a mask, thesubstrate is etched to form a groove (9).

申请人：NEC CORPORATION

代理机构：Young & Thompson

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